Many of the manufacturers depend upon nanotechnology solutions to produce various semiconductor components, such as quantum dots and carbon nanotubes (CNTs). In order to produce essential devices, the patterns for different lithography steps that belong to a single structure must be properly aligned to each another. The first pattern transferred to a wafer usually includes a set of alignment marks, which are high precision features that are used as the reference when positioning subsequent patterns. These subsequent patterns are important in identifying the size of wafer and also alignment. The complete design with all mask layers combined is called the layout of the device. Enterprises typically use software such as CAD/CAM specifically for designing the masks. One of the major factors responsible for the growth of the mask alignment market is the growing demand for nano sensors. Additionally, these factor also tend to fuel the demand for semiconductor integrated chips for various different applications, such as consumer electronic devices, communication systems, sensor and detectors, and storage devices, increases.
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Some of the prominent key players in the mask alignment system market include E V Group (Austria), Neutronix Inc (U.S.), SÜSS MicroTec AG (Germany), Aixtron SE (Germany), Applied Materials, Inc (U.S.), ASML Holding (Netherlands), Vistec Electron Beam GmbH (Germany), Veeco Instruments, Inc (U.S.), Bruker Corporation (U.S.), among others.
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